Listed below are the semiconductor processing and characterization facilities to which the Advanced Devices and Sustainable Energy Laboratory (ADSEL) group has access. The facilities are separated into three broad categories: growth and processing equipment, transport measurement equipment, and optical measurement equipment. In addition to the ADSEL owned facilities, the Virginia Tech associated facilities are listed towards the bottom. Clicking on an image thumbnail below will enlarge the image.


Electronic Materials Growth | Structural Characterization | Optical Measurement | Transport Measurement | Virginia Tech Associated Facilities


Electronic Materials Growth

MBE Growth Facilities for Compound Semiconductors and Germanium
MBE Growth Facility for Compound Semiconductors

1. A dual chamber MBE growth facility for both III-V and Ge connected by an ultra-high vacuum transfer chamber.
2. Group-III: Ga, In, Al; Group-V: As, Sb, P; Dopants: Si, Be, Te.
3. In-situ reflection high energy electron diffraction (RHEED) capability in order to:
  • Analyze the initial surface pattern;
  • Analyze surface reconstruction; and,
  • Monitor the entire growth.
4. An ultra-high vacuum transfer chamber prevents cross-contamination between III-V and Ge materials.
5. An optical IR pyrometer provides a real-time temperature feedback loop.

Solid Source Germanium MBE Growth Facility and Germanium SUMO cell
Solid Source Ge MBE Growth Facility and Ge SUMO cell

1. A solid source SUMO Ge cell for epitaxial Ge layer growth.
2. Allows for the growth rate and growth temperature to be precisely controlled during growth.

Antimony (Sb) Cracker for III-V MBE Growth Facility (Just arrived)
Antimony (Sb) Cracker for III-V MBE Growth Facility


Structural Characterization

Optical Microscope
MBE Growth Facility for Compound Semiconductors

1. Leitz Ergolux optical microscope (donated by Intel) to inspect the surface defects or other features.
2. Allows to quick change of magnification during measurement.
Nomarski (Differential Interference Contrast) Microscope
Nikon Nomarski Microscope

1. Nikon Optophot Nomarski microscope (Left) to inspect the surface defects or other features and surface cross-hatch pattern.
2. Attached Nikon digital camera (right) for capturing surface feature.
3. Additional attached eyepiece helped to realize two person observe the object at the same time.
Panalytic X'pert Pro Triple Axis X-ray Diffractometer
Panalytic X'pert Pro Triple Axis X-ray Diffractometer


PIXcel Detector XRD System for Fast Reciprocal Space Mapping
PIXcel Detector XRD System for Fast Reciprocal Space Mapping

Sample Preparation for Transmission Electron Microscopy
TEM sample preparation

1. TEM furnace (Left) for bonding two samples fact-to-face.
2. Precision thickness control during sample polishing.
3. Thickness control down to about 20um prior to ion milling and TEM imaging.

Transport Measurement Facilities

Contact Metal Deposition System
Kurt J. Lesker PVD 250 Metal Deposition System


Thermolyne 21100 Tube Furnace for Contact Annealing
Thermolyne 21100 Tube Furnace for Contact Annealing

1. Contact annealing furnace to form Ohmic and Schottky contact.
2. Forming gas annealing of metal deposited contact to avoid oxygen exposure and superior ohmic contact for transport measurements.
3. Quartz tube and boat to avoid contamination and easy cleaning.
Temperature Dependent Hall Measurement System
Temperature Dependent Hall Measurement System


1. Ecopia temperature dependent (77K to 350K) Hall measure system.
2. Easy mounting of sample during measurement and not restricted by size of sample up to 1.5cmx1.5cm.
3. Fast measurement and data processing.
Advanced Research System Cryogenic Probe Station (Company photos, actual photos coming soon after installation)
Advanced Research System Cryogenic Probe Station

Enable to perform I-V and C-V from liquid helium to 200oC temperature.
Integrated I-V, C-V, and G-V Characterization System with Cascade Summit 9000 Probe Station
Integrated I-V, C-V, G-V and Pulse I-V/C-V Measurement System with Cascade Summit 9000 Probe Station


Keithley 4200-SCS Semiconductor Characterization System
Keithley 4200-SCS Semiconductor Characterization System


Tektronix 2GHz Oscilloscope for Pulse I-V/C-V Measurement
Tektronix 2GHz Oscilloscope for Pulse I-V/C-V Measurement



Temperature Dependent (RT to 300C) Probe Station
Temperature Dependent (RT to 200C) Probe Station



Optical Measurement Facilities

Fluorescence Spectroscopy (under construction)
Oriel IQE 200 Solar Simulator for Multijunction Solar Cell Characaterization

Solar Simulator and Oriel QE 200 System
Oriel IQE 200 Solar Simulator for Multijunction Solar Cell Characaterization




Virginia Tech Associated Facilities


ADSEL Research Projects and Results Showcase
ADSEL Research Projects and Results Showcase